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Method of fabrication of AIGE bonding in a wafer

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专利名称:Method of fabrication of AI/GE bonding in a

wafer packaging environment and a productproduced therefrom

发明人:Steven S. Nasiri,Anthony Francis Flannery, Jr.申请号:US12184231申请日:20080731公开号:US08084332B2公开日:20111227

专利附图:

摘要:A method of bonding of germanium to aluminum between two substrates tocreate a robust electrical and mechanical contact is disclosed. An aluminum-germanium

bond has the following unique combination of attributes: (1) it can form a hermetic seal;(2) it can be used to create an electrically conductive path between two substrates; (3) itcan be patterned so that this conduction path is localized; (4) the bond can be made withthe aluminum that is available as standard foundry CMOS process. This has the significantadvantage of allowing for wafer-level bonding or packaging without the addition of anyadditional process layers to the CMOS wafer.

申请人:Steven S. Nasiri,Anthony Francis Flannery, Jr.

地址:Saratoga CA US,Los Gatos CA US

国籍:US,US

代理机构:Sawyer Law Group, P.C.

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