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WAFER LEVEL PACKAGE AND FABRICATION METHOD THEREOF

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专利名称:WAFER LEVEL PACKAGE AND FABRICATION

METHOD THEREOF

发明人:Shing-Yih Shih,Neng-Tai Shih,Hsu Chiang申请号:US14745473申请日:20150622

公开号:US20160372395A1公开日:20161222

专利附图:

摘要:A semiconductor device includes a semiconductor device includes an interposerhaving a first side and a second side opposite to the first side, wherein the interposercomprises a redistribution layer (RDL), and the RDL comprises a first passivation layer on

the first side and a second passivation layer on the second side; at least one active chipmounted on the first passivation layer on the first side through a plurality of first bumpspenetrating through the first passivation layer; a molding compound disposed on thefirst side, the molding compound covering the at least one active chip and a top surfaceof the first passivation layer; and a plurality of solder bumps mounted on the firstpassivation layer on the second side.

申请人:INOTERA MEMORIES, INC.

地址:Taoyuan City TW

国籍:TW

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