专利内容由知识产权出版社提供
专利名称：CATHODE ARC SOURCE
发明人：SHI, Xu,TAY, Beng, Kang,TAN, Hong,
Siang,FLYNN, David, Ian
申请号：EP97932940.6申请日：19970724公开号：EP0914670B1公开日：20030129
摘要：A cathode arc source has means for generating first and second magnetic fields,of opposite or reverse direction to each other. The resultant magnetic field includes anull point between the target and the substrate, though close to the target. Fieldstrength normal to the target is zero at the null point, and field strength lateral to thetarget is strong at the null point. A target is made by pressing graphite powder atelevated temperature and pressure in the absence of binding material. Both source andtarget contribute to reduced macroparticles in deposited films.
申请人：FILPLAS VACUUM TECHNOLOGY PTE
地址：SG
国籍：SG
代理机构：Schlich, George William
更多信息请下载全文后查看
