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专利名称：METHODS AND APPARATUS FOR USE IN A
DEVICE MANUFACTURING METHOD
发明人：VAN HAREN, Richard, Johannes
Franciscus,VAN DIJK, Leon
Paul,MALAKHOVSKY, Ilya,OTTEN, Ronald,Henricus Johannes,SADEGHINIA, Mahdi
申请号：EP171919.7申请日：20170918公开号：EP3457213A1公开日：20190320
专利附图：
摘要：Methods and associated apparatus for reconstructing a free-form geometry ofa substrate, the method comprising: positioning the substrate on a substrate holderconfigured to retain the substrate under a retaining force that deforms the substratefrom its free-form geometry; measuring a height map of the deformed substrate; andreconstructing the free-form geometry of the deformed substrate based on an expecteddeformation of the substrate by the retaining force and the measured height map.
申请人：ASML Netherlands B.V.
地址：P.O. Box 324 5500 AH Veldhoven NL
国籍：NL
代理机构：Peters, John Antoine
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