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专利名称：Measuring apparatus, measuring method,
and method of manufacturing an opticalcomponent
发明人：Iijima, Hitoshi,Maeda, Atsushi申请号：EP13159880.7申请日：20130319公开号：EP25053A1公开日：20131002
专利附图：
摘要：To eliminate influence of undesirable light component from an object whenmeasuring optical characteristics such as shape and wavefront aberration of the object,
light from light source (101) is separated by polarization beam splitter (103) intomeasuring light (L1) that irradiates and travels via the object (108) and is condensed onimage plane (P) through microlenses (114a) of microlens array (114), and reference light(L2) that does not irradiate the object and is guided to the image plane by reference lightoptical system (109). A computer (113) acquires picked-up images sequentially from CCDimage sensor (116) arranged on the image plane while changing optical path length ofthe reference light by movable stage (117), extracts interference light spots generatedthrough interference between signal light component and the reference light from thepicked-up images, calculates positions of the interference light spots, and calculatesdeviation amounts of positions from predetermined reference positions.
申请人：Canon Kabushiki Kaisha
地址：30-2 Shimomaruko 3-chome Ohta-ku Tokyo 146-8501 JP
国籍：JP
代理机构：TBK
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