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VACUUM INTEGRATED ELECTRONIC DEVICE AND MANUFACTUR

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专利名称:VACUUM INTEGRATED ELECTRONIC DEVICE

AND MANUFACTURING PROCESS THEREOF

发明人:Davide Giuseppe Patti,Myung Sung Kim申请号:US151505申请日:20160510

公开号:US20170148604A1公开日:20170525

专利附图:

摘要:A vacuum integrated electronic device has an anode region of conductivematerial; an insulating region on top of the anode region; a cavity extending through theinsulating region and having a sidewall; and a cathode region. The cathode region has a

tip portion extending peripherally within the cavity, adjacent to the sidewall of the cavity.The cathode region is formed by tilted deposition, carried out at an angle of 30-60° withrespect to a perpendicular to the surface of device.

申请人:STMICROELECTRONICS S.R.L.,STMICROELECTRONICS PTE LTD

地址:Agrate Brianza IT,Singapore SG

国籍:IT,SG

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