专利内容由知识产权出版社提供
专利名称：Method of manufacturing a structure on a
substrate
发明人：Daisuke Yajima申请号：US15270422申请日：20160920公开号：US09983480B2公开日：20180529
专利附图：
摘要：A method includes dividing a single beam emitted from a coherent light sourceinto at least two branch beams, and causing the branch beams to cross each other at apredetermined interference angle thereby generating interference pattern. The method
also includes irradiating a target surface of a substrate with the interference pattern. Themethod also includes dividing the target surface of the substrate into a plurality ofpredetermined shapes, and repeating a first substep of irradiating each predeterminedshape with every shot of the interference pattern, and a second substep of conveying thesubstrate in a stepwise manner such that the predetermined shapes overlap each otherin the stepwise manner. The method also includes causing a line-to-line pitch of theinterference fringes in one of the predetermined shapes to align with the line-to-linepitch of the interference fringes in a next predetermined shape upon repeating the firstand second substeps.
申请人：USHIO DENKI KABUSHIKI KAISHA
地址：Tokyo JP
国籍：JP
代理机构：Studebaker & Brackett PC
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