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Semiconductor device having an insulated gate

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专利名称:Semiconductor device having an insulated

gate

发明人:Christopher Harris,Andrei Konstantinov,Erik

Janzen

申请号:US08/829481申请日:19970328公开号:US059008A公开日:19990504

摘要:A semiconductor device comprises a semiconductor layer of SiC and aninsulating layer thereon for insulating the SiC layer with respect to a metal plateconstituting a gate and connectable to a voltage for creating a conducting surfacechannel at a SiC layer-insulating layer interface, wherein at least a portion of theinsulating layer closest to the interface is made of a crystalline material which is

substantially lattice-matched to SiC and has substantially the same coefficient of thermalexpansion as SiC; and wherein the material has AlN as the only component or as a majorcomponent of an alloy with insulating properties.

申请人:ABB RESEARCH LTD.

代理机构:Pollock, Vande Sande & Amernick

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